“真空术语”好像论坛中没有,发一个希望有朋友喜欢。 +[. Yy
--------------------------------------------------- v0l_w
真空术语 eXl=i-'
qO`qJ/
1.标准环境条件 standard ambient condition: xeTgV&$@
2.气体的标准状态 standard reference conditions forgases: E&~nps8e
3.压力(压强)p pressure: rSVgWr8
4.帕斯卡Pa pascal: Cpx+qQt0
5.托Torr torr: q\9d6u=Gm
6.标准大气压atm standard atmosphere: 4-v6=gz.
7.毫巴mbar millibar: R
UTnc
8.分压力 partial pressure: 1q.(69M
9.全压力 total pressure: J0220 _
10.真空 vacuum: 2)/NFZ
11.真空度 degree of vacuum: l!IKUzt)7
12.真空区域 ranges of vacuum: {b!7
.Cd=
13.气体 gas: $1*3!}_0
14.非可凝气体 non-condensable gas: }{],GHCjQ
15.蒸汽vapor: gY9\o#)<
16.饱和蒸汽压saturation vapor pressure: x|~zHFm6
17.饱和度degree of saturation: mxqG-*ch-
18.饱和蒸汽saturated vapor: ]y1fM0
19.未饱和蒸汽unsaturated vapor: _`a&9i
&
20.分子数密度n,m-3 number density of molecules: XY+y}D
%
21.平均自由程ι、λ,m mean free path: 2>hz_o{5',
22.碰撞率ψ collision rate: (xyS7q]m
23.体积碰撞率χ volume collision rate: "2Op[~V
24.气体量G quantity of gas: %c6E-4b
25.气体的扩散 diffusion of gas: 0-2"FdeQU
26.扩散系数D diffusion coefficient; diffusivity: s\0K o1
27.粘滞流 viscous flow: m s~8QL
28.粘滞系数η viscous factor: :mv`\
29.泊肖叶流 poiseuille flow: ;rBp1[qVe
30.中间流 intermediate flow: (v#pj8aE
31.分子流 molecular flow: cBEHH4U
32克努曾数 number of knudsen: [6gO
33.分子泻流 molecular effusion; effusive flow: 3x5!a5$Y
34.流逸 transpiration: !0fI"3P@r
35.热流逸 thermal transpiration: jQtSwVDr
36.分子流率qN molecular flow rate; molecular flux: 0rzVy/Z(
37.分子流率密度 molecular flow rate density; density of molecular flux: yBn_Kd
38.质量流率qm mass flow rare: v:d9o.h
39.流量qG throughput of gas: T{S4|G1R6
40.体积流率qV volume flow rate: m@oUvxcd
41.摩尔流率qυ molar flow rate: `Q9+k<
42.麦克斯韦速度分布 maxwellian velocity distribution: HcJE0-"
43.传输几率Pc transmission probability: k90B!kg
44.分子流导CN,UN molecular conductance: W^xZ+]
45.流导C,U conductance: !dv-8C$U
46.固有流导Ci,Ui intrinsic conductance: +Z+ExS<#z
47.流阻W resistance: -i_En^Fi
48.吸附 sorption: O{n<WQd{CY
49.表面吸附 adsorption: ^Rmoz1d
50.物理吸附physisorption: NfF~dK|
51.化学吸附 chemisorption: \p6 }
52.吸收absorption: vR]mSX3)?
53.适应系数α accommodation factor: ac6*v49
54.入射率υ impingement rate: fS./y=j(X
55.凝结率condensation rate: #%cR%Z
56.粘着率 sticking rate: 5G?.T?
57.粘着几率Ps sticking probability: Kpg:yrc['
58.滞留时间τ residence time: EUwQIA2c8N
59.迁移 migration: ,h!X k
60.解吸 desorption: )vHi|~(
61.去气 degassing: B| Q6!
62.放气 outgassing: %CT!$Y'n
63.解吸或放气或去气速率qGU desorption or outgassing or degassing rate: ]p$zvMf}
64.蒸发率 evaporation rate: $Sb@zLi)
65.渗透 permeation: J~dTVBx
66.渗透率φ permeability: T}2:.Hk:N
67.渗透系数P permeability coefficient NW De-<fQ
2. 1.真空泵 vacuum pumps pbdF]>\
1-1.容积真空泵 positive displacement pump: d;g-3Pf
⑴.气镇真空泵 gas ballast vacuum pump: T~:_}J
⑵.油封(液封)真空泵oil sealed (liquid-sealed) vacuum pump: 2v\W1VF
⑶.干封真空泵 dry-sealed vacuum pump: g8Aj `O
⑷.往复真空泵 piston vacuum pump: Ej|A
; &E
⑸.液环真空泵 liquid ring vacuum pump: b"P&+c
⑹.旋片真空泵 sliding vane rotary vacuum pump: X2P``YFV{
⑺.定片真空泵 rotary piston vacuum pump: )G4rJ~#@
⑻.滑阀真空泵 rotary plunger vacuum pump: oeGS
⑼.余摆线真空泵 trochoidal vacuum pump: qT0_L
⑽.多室旋片真空泵 multi-chamber sliding vane rotary vacuum pump: irmwc'n]
⑾.罗茨真空泵 roots vacuum pump: .Qk{5=l6P
1-2.动量传输泵 kinetic vacuum pump: jZ/+~{<
⑴.牵引分子泵molecular drag pump: lEa W7j
⑵.涡轮分子泵turbo molecular pump: H PTHF
⑶.喷射真空泵ejector vacuum pump: uWrFunh%
⑷.液体喷射真空泵liquid jet vacuum pump: 2H>aC
wfX
⑸.气体喷射真空泵gas jet vacuum pump: {jhcZ"#>\
⑹.蒸汽喷射真空泵vapor jet vacuum pump : Gt5$6>A
⑺.扩散泵diffusion pump : SW=aHM
⑻.自净化扩散泵self purifying diffusion pump: #4q1{)=
⑼.分馏扩散泵 fractionating diffusion pump : Q;@X2JSp
⑽.扩散喷射泵diffusion ejector pump : .$^wy3:F"
⑾.离子传输泵ion transfer pump: <O
bH f`Q
1-3.捕集真空泵 entrapment vacuum pump: %/md"S
⑴吸附泵adsorption pump: .m!s". ?[
⑵.吸气剂泵 getter pump: r?afv.@L2
⑶.升华(蒸发)泵 sublimation (evaporation)pump : IrUi
Eq
⑷.吸气剂离子泵getter ion pump: b.,$# D{p
⑸.蒸发离子泵 evaporation ion pump: NlMQHma
⑹.溅射离子泵sputter ion pump: h=Oh9zsz8
⑺.低温泵cryopump: dv[\.T`LY
.f+9 A>
2.真空泵零部件 wmiafBA e
2-1.泵壳 pump case: x57'Cg \
2-2.入口 inlet: aulaX/'-_
2-3.出口outlet: i&1U4q
2-4.旋片(滑片、滑阀)vane; blade : s8yCC#H"
2-5.排气阀discharge valve: T7ki/hjRb
2-6.气镇阀gas ballast valve: UCn.t
2-7.膨胀室expansion chamber: oX#9RW/ >I
2-8.压缩室compression chamber: S8vx[ <
2-9.真空泵油 vacuum pump oil: ,NDxFy;d
2-10.泵液 pump fluid: LEA;dSf
2-11.喷嘴 nozzle: j]#wrm
2-13.喷嘴扩张率nozzle expansion rate: `TAcZl=8
2-14.喷嘴间隙面积 nozzle clearance area : Q{8qm<0g
2-15.喷嘴间隙nozzle clearance: !HvGlj@(|
2-16.射流jet: )I?RMR
2-17.扩散器diffuser: bt0djJRw
2-18.扩散器喉部diffuser thoat: z6Fun
2-19.蒸汽导管vapor tube(pipe;chimney): GU5W|bS
2-20.喷嘴组件nozzle assembly: O<bDU0s{M
2-21.下裙skirt: Ys)+9yPPn
5UPPk$8`
3.附件 tb:
3-1阱trap: bD d_}
⑴.冷阱 cold trap: v^;-@ddr
⑵.吸附阱sorption trap: l~ CZW*/
⑶.离子阱ion trap: H
kSL5@
⑷.冷冻升华阱 cryosublimation trap: Cv0&prt
3-2.挡板baffle: v?FhG
b~1
3-3.油分离器oil separator: 'G52<sF
3-4.油净化器oil purifier: i+U@\:=
3-5.冷凝器condenser: ~NA1SZ{Y+
KQ- ,W8Q5
4.泵按工作分类 (K<Z=a
4-1.主泵main pump: dG"K/|
4-2.粗抽泵roughing vacuum pump: hyM'x*
4-3.前级真空泵backing vacuum pump: aX:#'eDB
4-4.粗(低)真空泵 roughing(low)vacuum pump: *O!T!J
4-5.维持真空泵holding vacuum pump: bx;yHIRb
4-6.高真空泵high vacuum pump: Al=(sHc'
4-7.超高真空泵ultra-high vacuum pump: ~v^%ze
4-8.增压真空泵booster vacuum pump: jC#`PA3m=
`Fz\wPd
5.真空泵特性 x GwTk
5-1.真空泵的抽气速率(体积流率)s volume flow rate of a vacuum pump: C{DlcZ<
5-2.真空泵的抽气量Q throughput of vacuum pump:。 RfD{g"]y
5-3.起动压力starting pressure: oo;;y,`8py
5-4.前级压力 backing pressure : kboizJp
5-5.临界前级压力 critical backing pressure: .MzOLv
5-6.最大前级压力maximum backing pressure: wwo(n$!\
5-7.最大工作压力maximum working pressure: ~6\& y
5-8.真空泵的极限压力ultimate pressure of a pump: ?e"Wu+q~L
5-9.压缩比compression ratio: B{[f}h.n
5-10.何氏系数Ho coefficient: >0kmRVd
5-11.抽速系数speed factor: (s5<
5-12.气体的反扩散back-diffusion of gas: ]z+*?cc
5-13.泵液返流back-streaming of pump fluid: _{[k[]
5-14.返流率back-streaming rate pk;ff q@
5-15.返迁移back-migration: f37ji
5-16.爆腾bumping: ,Le&I9*%
5-17.水蒸气允许量qm water vapor tolerable load: -J-3_9I
5-18.最大允许水蒸气入口压力maximum tolerable water vapor inlet pressure: hN Z4v/
5-19.蒸汽喷射泵、扩散泵或扩散喷射泵的加热时间warm-up time for a vapor jet pump or a diffusion pump or a diffusion ejector pump: aJEbAs}
5-20.蒸汽喷射泵、扩散泵或扩散喷射泵的冷却时间cool-down time for a vapor jet pump or a diffusion pump or a diffusion ejector pump _)OA$
3. 1.一般术语 Y')O>C0~
1-1.压力计pressure gauge: (y-x01H
1-2.真空计vacuum gauge: cWgbd^J
⑴.规头(规管)gauge head: YgO aZqN
⑵.裸规nude gauge : -iY9GN89c
⑶.真空计控制单元gauge control unit : - 3C* P
⑷.真空计指示单元gauge indicating unit : Y1#-^,qg
ox!|)^`$_
2.真空计一般分类 b24NL'jm
2-1.压差式真空计differential vacuum gauge: }f<fgY
2-2.绝对真空计 absolute vacuum gauge: I{`KKui<M
2-3.全压真空计total pressure vacuum gauge: Cf.pTYSl
2-4.分压真空计;分压分析器partial pressure vacuum gauge; partial pressure analyser: JZs|~@
2-5.相对真空计relative vacuum gauge : _fVh%_oH1
$
/}: P
3.真空计特性 *37LN
3-1.真空计测量范围pressure range of vacuum gauge: 7JxE|G
3-2.灵敏度系数sensitivity coefficient: S4#A#a2J
3-4. 电离规系数(压力单位倒数)ionization gauge coefficient (in inverse pressure units): &&]"Y!r -
3-5.规管光电流photon current of vacuum gauge head: cmwzKu%
3-6.等效氮压力equivalent nitrogen pressure : 4RK.Il*d
3-7.X射线极限值 X-ray limit: uAW*5 `[
3-8.逆X射线效应anti X-ray effect:
1m&!l6Jk
3-9.布利尔斯效应blears effect: DQ}_9?3
FBR$,j;Y
4.全压真空计 zF[3%qZE:T
4-1.液位压力计liquid level manometer: a)I=U[
4-2.弹性元件真空计elastic element vacuum gauge: WE+sFaKq-
4-3.压缩式真空计compression gauge: Qh)|FQ[s$r
4-4.压力天平pressure balance: )![f\!'PI
4-5.粘滞性真空计viscosity gauge : ;J,,f1Vw
4-6.热传导真空计thermal conductivity vacuum gauge : Uq9,(tV`6g
4-7.热分子真空计thermo-molecular gauge: [_g#x(=
4-8.电离真空计ionization vacuum gauge: {{^Mr)]5K
4-9.放射性电离真空计radioactive ionization gauge: ^q4l4)8jX
4-10.冷阴极电离真空计cold cathode ionization gauge: ZTQ$Ol+{q
4-11.潘宁真空计penning gauge: >XD02A[
4-12.冷阴极磁控管真空计cold cathode magnetron gauge: JxX
jDYrU
4-13.放电管指示器discharge tube indicator: XA&tTpfJE
4-14.热阴极电离真空计hot cathode ionization gauge: a}5vY
4-15.三极管式真空计triode gauge: H]%mP|
4-16.高压力电离(中真空)真空计high pressure (medium vacuum) ionization gauge: iFAoAw(
4-17.B-A型电离真空计Bayard-Alpert gauge: }vXA`)Ns
4-18.调制型电离真空计modulator gauge: jw`&Np2Q
4-19.抑制型电离真空计suppressor gauge: v`z=OHc
4-20.分离型电离真空计extractor gauge: y9V;IXhDc
4-21.弯注型电离真空计bent beam gauge: (&9DB
4-22.弹道型电离真空计 orbitron gauge : k#8S`W8^
4-23.热阴极磁控管真空计hot cathode magnetron gauge: oiTMP`Y
2.HZ+1
5.分压真空计(分压分析器) Q9Y9{T
5-1.射频质谱仪radio frequency mass spectrometer: `@u+u0
5-2.四极质谱仪(四级滤质器)quadrupole mass spectrometer;quadrupole mass filer: /{eih]`x(
5-3.单极质谱仪momopole mass spectrometer: Z-? Iip{
5-4.双聚焦质谱仪double focusing mass spectrometer: "6`)vgI~
5-5.磁偏转质谱仪magnetic deflection mass spectrometer: .d#G]8suF
5-6.余摆线聚焦质谱仪trochoidal focusing mass spectrometer: C }h<ldlY
5-7.回旋质谱仪omegatron mass spectrometer: [I+)Ak5
5-8.飞行时间质谱仪time of flight mass spectrometer: !Zk%P
dVj'
6.真空计校准 1cHSgpoJ
6-1.标准真空计reference gauges: zVc7q7E
6-2.校准系统system of calibration: g6[/F-3Qlf
6-3.校准系数K calibration coefficient: ZbZAx:L
6-4.压缩计法meleod gauge method: 2;Y@3d:z
6-5.膨胀法expansion method: -7Aw
s)
6-6.流导法flow method: @w#gRQCl
4. 1.真空系统vacuum system JR?
)SGB
1-1.真空机组pump system: Z3X&<Y5
1-2.有油真空机组pump system used oil : l ) )~&
1-3.无油真空机组oil free pump system )CwMR'LV
1-4.连续处理真空设备continuous treatment vacuum plant: i-i}`oN
1-5.闸门式真空系统vacuum system with an air-lock: M0;t%*1
1-6.压差真空系统differentially pumped vacuum system: gJcXdv=]2
1-7.进气系统gas admittance system: PO1:9
^H\-3/si*
2.真空系统特性参量 uDy>xJ|
2-1.抽气装置的抽速volume flow rate of a pumping unit : S2At$47v
2-2.抽气装置的抽气量throughput of a pumping unit : V:0uy>
2-3.真空系统的放气速率degassing(outgassing) throughput of a vacuum system: H/^TXqQ8
2-4.真空系统的漏气速率leak throughput of a vacuum system: rr07\;
2-5.真空容器的升压速率rate of pressure rise of a vacuum chamber: .qb_/#Bas
2-6.极限压力ultimate pressure: <QkN}+B=
2-7.残余压力residual pressure: U'h[{ek
2-8.残余气体谱residual gas spectrum: xnhDW7m
2-9.基础压力base pressure: !F7EAQn{(
2-10.工作压力working pressure: lkSz7dr@
2-11.粗抽时间roughing time: Ye\*b?6
2-12.抽气时间pump-down time: f)AW !/
2-13.真空系统时间常数time constant of a vacuum system: [)J49
2-14.真空系统进气时间venting time: >DL-Q\U
?*z(1!
3.真空容器 ~-`BSR
3-1.真空容器;真空室vacuum chamber: Sf4h!ly
3-2.封离真空装置sealed vacuum device: {-v\&w
3-3.真空钟罩vacuum bell jar: u':0"5}
3-4.真空容器底板vacuum base plate: 3@Zz-~4Td
3-5.真空岐管vacuum manifold: ^qId]s
3-6.前级真空容器(贮气罐)backing reservoir: } TX'Z?Lq
3-7.真空保护层outer chamber: _#^A:a^e8
3-8.真空闸室vacuum air lock: >QZt)<[
3-9.真空冷凝器;蒸汽冷凝器device for condensing vapor: x3I%)@-Z
?{.b9`
4.真空封接和真空引入线 Wf`OyeRz
4-1.永久性真空封接permanent seal : $5Y^fwIK
4.2.玻璃分级过渡封接graded seal : ,#
jOf{L*
4-3.压缩玻璃金属封接compression glass-to-metal seal: r"u(!~R
4-4.匹配式玻璃金属封接matched glass-to-metal seal: 8@LykJbP
4-5.陶瓷金属封接ceramic-to-metal seal: 1n"+~N^\
4-6.半永久性真空封接semi-permanent seal : ]=86[A-2N
4-7.可拆卸的真空封接demountable joint: bKt3x+x(
4-8.液体真空封接liquid seal kq1M<lk
4-9.熔融金属真空封接molten metal seal: ,QHx*~9
4-10.研磨面搭接封接ground and lapped seal: QkCoW[sn
4-11.真空法兰连接vacuum flange connection: jKCqH$
4-12.真空密封垫vacuum-tight gasket: Eip~~2
4-13.真空密封圈ring gasket: Xv5Ev@T
4-14.真空平密封垫flat gasket: P B6/<n9#
4-15.真空引入线feedthrough leadthrough: 1z};"A
4-16.真空轴密封shaft seal: Y%?!AmER
4-17.真空窗vacuum window: QhE("}1
4-18.观察窗viewing window: [@. jL0>
E~Up\f
5.真空阀门 d$?n6|4
5-1.真空阀门的特性characteristic of vacuum valves: pqQdr-aR=
⑴.真空阀门的流导conductance of vacuum valves: K`_E>k
⑵.真空阀门的阀座漏气率leak rate of the vacuum seat: T\e)Czz2-
5-2.真空调节阀regulating valve: Uwm[q+sTp
5-3.微调阀 micro-adjustable valve:
4qSS<SqY
5-4.充气阀charge valve: :J4C'N
5-5.进气阀gas admittance valve: /hEGk~
5-6.真空截止阀break valve: TNPGw!
5-7.前级真空阀backing valve: xX4^nem\G
5-8.旁通阀 by-pass valve: ://|f
5-9.主真空阀main vacuum valve: VzYP:QRz
5-10.低真空阀low vacuum valve: |C2.Zay
5-11.高真空阀high vacuum valve: \$HB~u%dr
5-12.超高真空阀;UHV阀 ultra-high vacuum valve: 8DS5<
5-13.手动阀manually operated valve: f s"V'E2a
5-14.气动阀pneumatically operated valve: \q`+
5-15.电磁阀electromagnetically operated valve: Q-dHR
i
5-16.电动阀valve with electrically motorized operation: %"KWjwp
5-17.挡板阀baffle valve: (zLIv9$
5-18.翻板阀flap valve: n$![b_)*
5-19.插板阀gate valve: ?e_}X3{
5-20.蝶阀butterfly valve: J0WXH/:
8H`l"
6.真空管路 \FY De
6-1.粗抽管路roughing line: VX>t!JP p
6-2.前级真空管路backing line: %/4_|@<'
6-3.旁通管路;By-Pass管路 by-pass line: +q=jB-eIx
6-4.抽气封口接头pumping stem: .HyiPx3^
6-5.真空限流件limiting conductance: $Q$d\Yvi
6-6.过滤器filter: B?YfOSF=5
5. 1.一般术语 \-iUuHP
1-1真空镀膜vacuum coating: 5~R{,]52
1-2基片substrate: nu9k{owB T
1-3试验基片testing substrate: {e
1-4镀膜材料coating material: !/(}meZj
1-5蒸发材料evaporation material: 2Ku#j
('
1-6溅射材料sputtering material: |b;M5w?
1-7膜层材料(膜层材质)film material: NizJq*V>
1-8蒸发速率evaporation rate: Rw=E_q{
1-9溅射速率sputtering rate: =$zr
t
1-10沉积速率deposition rate: .6/p4OR|
1-11镀膜角度coating angle: +#db_k
8}0y)aJ
2.工艺 np>!lF:
2-1真空蒸膜vacuum evaporation coating: WI4_4
(1).同时蒸发simultaneous evaporation: kuud0VWJ
(2).蒸发场蒸发evaporation field evaporation: HY| SLk/E
(3).反应性真空蒸发reactive vacuum evaporation: -Jrc'e4K
(4).蒸发器中的反应性真空蒸发reactive vacuum evaporation in evaporator: sF3
l##Wv
(5).直接加热的蒸发direct heating evaporation: :3*oAh8|
(6).感应加热蒸发induced heating evaporation: n2hsG.4
(7).电子束蒸发electron beam evaporation: ^t%M
(8).激光束蒸发laser beam evaporation: i R5soIR
(9).间接加热的蒸发indirect heating evaporation: :Du{8rV
(10).闪蒸flash evaportion: lz0]p
2-2真空溅射vacuum sputtering: F"#*8P
(1).反应性真空溅射 reactive vacuum sputtering: J& SuUh<
(2).偏压溅射bias sputtering: 44{:UhJkx
(3).直流二级溅射direct current diode sputtering: vlyNQ7"%
(4).非对称性交流溅射asymmtric alternate current sputtering: 1;[
<||K
(5).高频二极溅射high frequency diode sputtering: (9_e>2_
(6).热阴极直流溅射(三极型溅射)hot cathode direct current sputtering: ^g){)rz|
(7).热阴极高频溅射(三极型溅射)hot cathode high frequency sputtering: 9U1!"/F
(8).离子束溅射ion beam sputtering: CrX-?$
(9).辉光放电清洗glow discharge cleaning: ^a 5~FI:
2-3物理气相沉积PVD physical vapor deposition: i1&noRGl
2-4化学气相沉积CVD chemical vapor deposition: IX3yNTW"L
2-5磁控溅射magnetron sputtering: %a^!~qV
2-6等离子体化学气相沉积;PCVD plasma chemistry vapor deposition: (xJBN?NRO
2-7空心阴极离子镀HCD hollow cathode discharge deposition: ]b=A/*z
2-8电弧离子镀arc discharge deposition: yXl.Gq>]{
9>, \QrrH
3.专用部件 vKLG9ovlY
3-1镀膜室coating chamber: / ^M3-5@Q
3-2蒸发器装置evaporator device: dsoRPX']=
3-3蒸发器evaporator: ;.m[&h 0
3-4直接加热式蒸发器evaporator by direct heat: HY#("=9< h
3-5间接加热式蒸发器evaporator by indirect heat: dM.Ow!j
3-7溅射装置sputtering device: r~a}B.pj
3-8靶target: Z{)|w=
3-10时控挡板timing shutter: fb=vO U
3-11掩膜mask: >(Ddw N9l
3-12基片支架substrate holder: 1@@]h!>k:
3-13夹紧装置clamp: cwU6}*_zn
3-14换向装置reversing device: =
$Yk8,
3-15基片加热装置substrate heating device: 6UP3Ij
3-16基片冷却装置substrate colding device: &1n0(qB
~a)20
4.真空镀膜设备 -0){C|,6
4-1真空镀膜设备vacuum coating plant: tXGcwoOB
(1).真空蒸发镀膜设备vacuum evaporation coating plant: aq**w?l
(2).真空溅射镀膜设备vacuum sputtering coating plant: fP*C*4#X
4-2连续镀膜设备continuous coating plant: O4 URr
4-3半连续镀膜设备semi- continuous coating plant qo![#s
6. 1.漏孔 j}Mpc;XOc
1-1漏孔leaks: Qd=/e pkm
1-2通道漏孔channel leak: :9>nY
1-3薄膜漏孔membrane leak:
t/c^hTT
1-4分子漏孔molecular leak: Q'LU?>N)/
1-5粘滞漏孔vixcous leak: ]z@]Fi33Y
1-6校准漏孔calibrated leak: PSvRO%&
1-7标准漏孔reference leak : L(YT6Vmm+t
1-8虚漏virtual leak: xk<0QYv
1-9漏率leak rate:
MQI=
1-10标准空气漏率standard air leak rate: DvKMb-*S
1-11等值标准空气漏率equivalent standard air leak rate: e=C,`&sz
1-12探索(示漏)气体: SxyFFt
!"">'}E1
2.本底 R'_[RHFC
2-1本底background: )v.FAV:
2-2探索气体本底search gas background : ^`9OA`2
2-3漂移drift: hTqJDP"&F
2-4噪声noise: HKf3eC
aUQq<H 'R
3.检漏仪 {rr\hl-$
3-1检漏仪leak detector: X13bi}O6#
3-2高频火花检漏仪H.F. spark leak detector: *9 xD]ZZF
3-3卤素检漏仪halide leak detector: fe,CY5B{
3-4氦质谱检漏仪helium mass spectrometer leak detector: IrK )N
3-5检漏仪的最小可检漏率minimum detectable rate of leak detector: /$Jh5Bv
~Y$1OA8
4.检漏 Q0A1N[
4-1气泡检漏leak detection by bubbles: e;v2`2z2
4-2氨检漏leak detection by ammonia: uDUSR+E>
4-3升压检漏leak detection of rise pressure: "^7Uk#!
7
4-4放射性同位素检漏radioactive isotope leak detection: b ;b1V
4-5荧光检漏fluorescence leak detection *0tNun 5=3
7. 1.一般术语 n%hnL$!z
1-1真空干燥vacuum drying: f+RDvgkKU
1-2冷冻干燥freeze drying : TlJF{ <E
1-3物料material: "5FeP;
1-4待干燥物料material to be dried: NH!!.Z"
1-5干燥物料dried material : fNumY|%3
1-6湿气moisture;humidity: ^|2qD:
;
1-7自由湿气free moisture: \qPrY.-
1-8结合湿气bound moisture: 5VS<I\o}
1-9分湿气partial moisture: a7R7Ks|q
1-10含湿量moisture content: # jyAq$I0
1-11初始含湿量initial moisture content: g>{=R|uO5
1-12最终含湿量final residual moisture: <7+.5iB3
1-13湿度degree of moisture ,degree of humidity : o@-cT`HP
1-14干燥物质dry matter : HvU)GJ u b
1-15干燥物质含量content of dry matter: *HUqW}_r
j@f(cRAf#
2.干燥工艺 N~_gT
Jr~P
2-1干燥阶段stages of drying : N_U
D7P1
(1).预干燥preliminary dry: :/08}!_:
(2).一次干燥(广义)primary drying(in general): S45jY=)z
(3).一次干燥(冷冻干燥)primary drying(freeze-drying): m;|I}{r
(4).二次干燥secondary drying: dcsd//E
2-2.(1).接触干燥contact drying: 01b0;|
(2).辐射干燥 drying by radiation : 5Dd;?T>
(3).微波干燥microwave drying: MH-,+-Eq
(4).气相干燥vapor phase drying: s5 BV8 M
(5).静态干燥static drying: CEiGjo^
(6).动态干燥dynamic drying: ">7 bnOJ
2-3干燥时间drying time: %$Uw]a
2-4停留时间length of stay(in the drying chamber): G4~J+5m k
2-5循环时间cycle time: /$KW$NH4z
2-6干燥率 dessication ratio : U-d&q>_@A
2-7去湿速率mass flow rate of humidity: 4?cg6WJ'6
2-8单位面积去湿速率mass flow rate of humidity per surface area: L!5HE])<)
2-9干燥速度 drying speed : !!AutkEg>
2-10干燥过程drying process: /T0|<r!c
2-11加热温度heating temperature: (]L=$u4
2-12干燥温度temperature of the material being dried : oz QL2
2-13干燥损失loss of material during the drying process : J5-^@JYK
2-14飞尘lift off (particles): .$rcTZ
2-15堆层厚度thickness of the material: _XN sDW4|
6[i-Tl
3.冷冻干燥 R[6&{&E:
3-1冷冻freezing: sSxra!tv4
(1).静态冷冻static freezing: '-et:Lv7
(2).动态冷冻dynamic freezing: jw
H)x
(3).离心冷冻centrifugal freezing: &7cy9Z~m
(4).滚动冷冻shell freezing: 6Yu8ReuL
(5).旋转冷冻spin-freezing: NB[b[1 Ch
(6).真空旋转冷冻vacuum spin-freezing: >A6lX)
(7).喷雾冷冻spray freezing: zc_3\N
(8).气流冷冻air blast freezing:
gBN;j
3-2冷冻速率rate of freezing: 8Vp"}(Q
3-3冷冻物料frozen material: I#0$5a},u^
3-4冰核ice core: 3Dy.mt P
3-5干燥物料外壳envelope of dried matter: `R\0g\
3-6升华表面sublimation front: 2KU[Yd
3-7融化位置freezer burn: ZCa?uzeo]
D0~mu{;c$
4.真空干燥设备;真空冷冻干燥设备 }Q*8QV
4-1真空干燥设备和真空冷冻干燥设备vacuum drying plant and vacuum freeze drying plant: awUIYAgJ3
4-2真空干燥器和冷冻干燥器vacuum drying chamber and freeze drying chamber: N?aU<-Tn
4-3加热表面heating surface: 3>Yec6Hs
4-4物品装载面shelf : )%0#XC^/X5
4-5干燥器的处理能力throughput (of the vacuum drying chamber): p AD@oPC
4-6单位面积干燥器处理能力throughput per shelf area: AO/R2a(:
4-7冰冷凝器ice condenser: W,vb7v'
4-8冰冷凝器的负载load of the ice condenser: N:0mjHG
4-9冰冷凝器的额定负载rated load of the ice condenser Y|Z*|c.4OK
8. 1.一般术语 ,JR7N_"I
1-1试样sample : v6FYlKU@8
(1).表面层surface layer: J::dY~@
(2).真实表面true surface: NVQIRQ.
(3).有效表面积effective surface area: z7 }@8F
(4).宏观表面;几何表面macroscopic surface area; geometric surface area: {min9
(5).表面粒子密度surface particle density: 0h* AtZv_
(6).单分子层monolayer: 0@z78h=h
(7).表面单分子层粒子密度monolayer density: qT(j%F
(8).覆盖系数coverage ratio: Rh%x5RFFc
1-2激发excitation: -*3wNGh{
(1).一次粒子primary particle: |[0|j/V%O
(2).一次粒子通量primary particle flux: ;s{rJG{inG
(3).一次粒子通量密度density of primary particle flux:
Y.ic=<0H
(4).一次粒子负荷primary particle load: jZ)1]Q2
(5).一次粒子积分负荷integral load of primary particle: Rgg(rF=K6
(6).一次粒子的入射能量energy of the incident primary particle: #=h~Lr'UH
(7).激发体积excited volume: hW]:CIqk
(8).激发面积excited area: "gYn$4|R7*
(9).激发深度excited death: !pgkUzMW
(10).二次粒子secondary particles: uSH.c>
(11).二次粒子通量secondary particle flux: ">|fB&~A
(12).二次粒子发射能energy of the emitted secondary particles: 'z@(,5
(13).发射体积emitting volume: [W`
_`
(14).发射面积emitting area: VCtj8hKDr
(15).发射深度emitting depth: P)4SrqW_
(16).信息深度information depth: H_Vf_p?
(17).平均信息深度mean information depth: )jvYJ9s
1-3入射角angle of incidence: 2!}5shB
1-4发射角angle of emission: N|wI=To
1-5观测角observation: //xxSk
1-6分析表面积analyzed surface area: c<|;<8ew
1-7产额 yield : TX$j-TM'
1-8表面层微小损伤分析minimum damage surface analysis: ki39$A'8
1-9表面层无损伤分析non-destructive surface analysis: 40+~;20
1-10断面深度分析 profile analysis in depth; depth profile analysis : YjAwt;%-D
1-11可观测面积observable area: 3x=T&X+
1-12可观测立体角observable solid angle : B\`4TU}kE
1-13接受立体角;观测立体角angle of acceptance: /g@!#Dt
1-14角分辨能力angular resolving power: XI@;;>D1=U
1-15发光度luminosity: Cjdw@v0;
1-16二次粒子探测比detection ratio of secondary particles: ~m'PAC"Q$
1-17表面分析仪的探测极限detection limit of an apparatus for surface analysis: |4UW.dGHPo
1-18表面层分析仪灵敏度sensitivity of an apparatus for surface analysis: !;>j(xc
1-19表面层分析仪质量分辨能力mass resolving power of an apparatus for surface analysis: e2~&I`ct
1-20表面层分析仪能量分辨能力energy resolving power of an apparatus for surface analysis: 63 F@Ft
1-21本底压力base pressure: #fd;]
1-22工作压力working pressure: [5yLg
f!AcBfaLr
2.分析方法 Xf(H_&K
2-1二次离子质谱术;SIMS secondary ion mass spectroscopy: [jU.58*
(1).静态二次离子质谱术;静态SIMS static secondary ion mass spectroscopy : yP.,Dh s
(2).动态二次离子质谱术;动态SIMS dynamic secondary ion mass spectroscopy ;dynamic SIMS: )ERmSWq/u
2-2二次离子质谱仪;SIMS仪secondary ion mass spectrometer; SIMS apparatus: R1)v;^B|)
2-3离子散射表面分析ion scattering spectroscopy: 5=(fuY3
2-4低能离子散射的表面分析;离子散射谱测定ISS low energy ion scattering spectroscopy; ISS: VG'M=O{)3
2-5卢瑟福后向散射的表面分析;RBS;卢瑟福离子后向散射的表面分析;RIBS Rutherford backscattering spectroscopy; RBS; Rutherford ion backscattering spectroscopy; RIBS: 'GcN9D
2-6离子散射谱仪ion scattering spectrometer: *Yj!f6 8
2-7俄歇效应Auger process: $DBJ"8n2
2-8俄歇电子谱术;AES仪 Auger electron spectroscopy; AES: ei%L[>N
2-9俄歇电子能谱仪;AES仪Auger electron spectrometer ;AES apparatus:
2-10光电子谱术photoelectron spectroscopy : sF[7pE
(1).紫外光电子谱术;UPS ultraviolet photoelectron spectroscopy; UPS: $}+t|`*q8]
(2).X射线光电子谱术;X-ray photoelectron spectroscopy ; XPS: Z#+lwZD
2-11光电子谱仪photoelectron spectrometer: g$+ $@~
2-12低能电子衍射;LEED low energy electron diffraction ;LEED: oK\{#<gCZ
2-13低能电子衍射仪;LEED仪 apparatus for low energy electron diffraction ; LEED-apparatus: dz_~_|
2-14电子能损失谱术;ELS(也称EELS) electron energy loss spectroscopy(ELS): u)J&3Ah%
2-15电子能损失光谱仪;ELS仪 electron energy loss spectrometer ; ELS apparatus