hfvac |
2010-03-30 12:51 |
Dr. Frank Fenske received the M.S. and Ph.D. degrees in physics in 1974 and 1980, respectively. From 1974 to 1981 he worked on interface problems in MIS structures at the Academy of Sciences. Later he focused research on silicides and multilayer contact systems to silicon. Since 1991 he has been with the Hahn-Meitner-Institut Berlin (now Helmholtz-Zentrum Berlin), where he is working on a variety of problems related to the physics and technology of silicon based thin film solar cells. Areas of special interest are properties of transparent conducting oxides and absorber films in close relation to their preparation conditions by physical vapour deposition tech-niques. BMhuM~?( Yt4v}{+ 8mX:*$qm: Prof. Dr. Michael Heuken, born Oberhausen, Germany, 17 Nov. 1961. Dipl.-Ing./Dr. Ing. degree in Electrical Engineering, Duisburg University, Germany in 1985/1989. Senior engineer, RWTH Aachen (IHT), in the field of metalorganic vapor phase epitaxy for electronic and optoelectronic devices. 1994 finished Habilitation in semiconductor technology and devices with a thesis on ZnSSe based optoelectronic devices. Since 1997 joined AIXTRON AG Aachen, Germany, presently as Vice President Corporate Research and Development. 1999, honored as Professor at RWTH Aachen. Author and co-author of more than 400 publications. President of DGKK from 2002 to 2005, Councilor of IOCG (International Organization of Crystal Growth) representing Germany, board member of EPIC (European Photonics Industry Consortium), board member of OptechNet e.V and member of VDE/ITG. Referee for international journals. Several granted patents in the field of MOVPE technology. VC!g,LU|- RZj06|r8 D[Ld=e8t Dr. Alexander Lawerenz is head of the photovoltaics department at the CiS Re-search Institute for Microsensors and Photovoltaics in Erfurt, Germany. He studied physics at the Universities of Konstanz and Hamburg. In 2002 he achieved his PhD degree in Freiberg, Germany with a thesis on the interaction of dislocations and oxy-gen and their influence on carrier recombination in multicrystalline silicon. One year later he joined the CiS Forschungsinstitut working on the fields of mechanical and electrical properties of silicon wafers and on process engineering of silicon solar cells. Aca?C HlX7A1i/ |e3YTLsI Prof Dr. Frank Richter is Professor of Solid State Physics at Chemnitz University of Technology, Germany. After obtaining his PhD in 1974, he worked for 15 years at the Institute for Semiconductor Physics (IHP) in Frankfurt (Oder), Germany, and did research in microelectronic technology, particularly silicon epitaxy and silicides for intereconnects and contacts. In 1989, he moved to Chemnitz University. Since then, his scientific interest has been directed towards plasma-assisted thin film deposition and surface engineering. Current activities are focused on in-situ characterization of pulsed plasmas, process modeling, and mechanical characterization of thin films. He has published more than 100 refereed articles in high-level international journals as well as book chapters. Prof. Frank Richter is presently the President of the German Vacuum Society and is an elected member of the Review Board of Condensed Matter Physics of the German Research Foundation. rO1.8KKJ $,Y?qn/ Prof. Dr. Carsten Ronning is full professor and currently director of the Institute of Solid State Physics at the Friedrich-Schiller-University of Jena, Germany. He studied physics at the Universities of Bremen and Konstanz, and completed his PhD thesis entitled “Diamond-like materials prepared via mass selected ion beam deposition” in 1996. After holding a post-doc position at the North-Carolina State University (USA), he performed intense research at the University of Göttingen on thin films, semicon-ductor physics as well as on semiconductor nanowires. His position today at the Uni-versity Jena includes the heading of a Photovoltaics group specialised on the prepa-ration of CdTe and CIGS thin film solar cells. 81wmKqDEs } x'o`GuUf Dr. Johannes Struempfel is working as Chief Scientist at VON ARDENNE Com-pany in Dresden. This company which enjoys a long tradition is a leading manufac-turer for industrial vacuum coating equipments globally. Particularly focused on large area coatings deposited on glass, metal strips and webs VON ARDENNE applies PVD technologies for production using magnetron sputtering and high-rate electron beam evaporation. After his studies at Dresden Technical University, Dr. Struempfel was graduated as physicist. Since more than 35 years he is working at VON AR-DENNE in both Thin Film and Plasma Technologies. He is specialized in advanced developments of optical coatings for large area applications. In a very early stage he realized the control of highly productive reactive sputter processes for deposition of low and high index oxides. His particularly experiences are related to transparent conductive oxides TCO and cleaning of surfaces by plasma impact respectively. As an author of numerous papers and publications Dr. Struempfel is committed to sev-eral conference committees or boards within the international and German plasma community. r8L'C Zo,]Dx Prof. Dr. Dietrich R. T. Zahn Dietrich R. T. Zahn received a diploma in Physics from the RWTH Aachen in 1986 and a Ph.D. in Physics from the University of Wales Car-diff in 1988. After a post-doc period at the Technical University in Berlin, he became Professor of Semiconductor Physics at the Chemnitz University of Technology in 1993. His research focuses on the spectroscopic characterization of semiconductor interfaces and thin films, with particular emphasis on organic/inorganic hybrid sys-tems, low dimensional systems, e.g., quantum dot superlattices, as well as advanced interconnects in micro-/nanoelectronics. He is author or co-author of more than 400 related publications. Since 2006 he has been chairman of the Thin Film Division of the German Physical Society and Vice President for Research at the Chemnitz Uni-versity of Technology. q?&J | |