| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications PN~@
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations j`
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for Nanostructure Fabrication Using Scanning 5!C_X5M
Probe Microscopy 1 r[.> P$U
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo 1[*UYcD
Chapter 2 Atomic Force Microscope Lithography 33 +6smsL~<#v
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park % |q0-x
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, FtufuL?JS
Sensing, and Modification 65 KtS)'jf
C. Santschi, J. Polesel-Maris, J. Brugger, ? Y:x[pOe
and H. Heinzelmann iDl;!b&V.
Chapter 4 Using Biomolecules for Self-Assembly of Engineered o!E v;' D
Nano-Scale Structures and Devices 127 krq/7|
R. Mehta, J. Lund, and B. A. Parviz sfr(/mp(
Chapter 5 Nanofabrication Based on Self-Assembled iFSJL,QZ3
Alumina Templates 159 #jpoHvt h
S. Sen and N. A. Kouklin 6b8;}],|
Chapter 6 Nanowire Assembly and Integration 187 %or,{mmiM:
Z. Gu and D. H. Gracias #{r#;+
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 ULc`~]
L. Tong and E. Mazur in<Rq"L
Chapter 8 Extreme Ultraviolet Lithography 235 hA 3HVP_
H. Kinoshita |o'Q62`%}
Chapter 9 Electron Projection Lithography 285 -K(fh#<6KO
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata *?QE2&S:
Chapter 10 Electron Beam Direct Writing 341 :ztr)
K. Yamazaki : "6q, W
Chapter 11 Electron Beam Induced Deposition 377 rQ4*k'lA:
K. Mitsuishi sUl6hX4
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 f:zFFpP.j@
P. A. Crozier and C. W. Hagen 7 ;.xc{
Chapter 13 Focused Ion Beams and Interaction with Solids 431 >}~ #>Ru
T. Ishitani, T. Ohnishi, and T. Yaguchi |CgnCUv+
Chapter 14 Nano/Microstructuring of Ceramic Surfaces 2c<&eX8 "
by Unconventional Lithographic Methods 471 eLwTaW !C
R. C. Salvarezza and O. Azzaroni
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Chapter 15 Alternative Nanofabrication Approaches y AF+bCXo
f or Non-CMOS Applications 499 -B#y y ]8
C. V. Cojocaru, F. Cicoira, and F. Rosei /Y[~-Y+!,
Chapter 16 Nanofabrication of Nanoelectromechanical Systems ]!:oYAm
(NEMS): Emerging Techniques 543 HhA -[p
K. L. Ekinci and J. Brugger @vgG1w
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