| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications KL]@y!QU
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目录： |1`|E- S=
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations Yv!%Is
for Nanostructure Fabrication Using Scanning !( xeDX
Probe Microscopy 1 +JE
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A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo A-:58Qau+
Chapter 2 Atomic Force Microscope Lithography 33 gf6<`+/
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park :4|W;Lkd!
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, wkm;yCF+
Sensing, and Modification 65 Nq>74q]}n8
C. Santschi, J. Polesel-Maris, J. Brugger, 4}B9y3W:v
and H. Heinzelmann qG.HJ D
Chapter 4 Using Biomolecules for Self-Assembly of Engineered L1#z'<IO
Nano-Scale Structures and Devices 127 mx s=<
R. Mehta, J. Lund, and B. A. Parviz e2|2$|
Chapter 5 Nanofabrication Based on Self-Assembled mjUln8Jc
Alumina Templates 159 E.kGBA;a?
S. Sen and N. A. Kouklin f,Vj8@p)x
Chapter 6 Nanowire Assembly and Integration 187 0sW=;R2
Z. Gu and D. H. Gracias _ 1[5~Pnh
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 j`1% a]Bwc
L. Tong and E. Mazur |<&9_Aq_
Chapter 8 Extreme Ultraviolet Lithography 235 WXP=U^5Si
H. Kinoshita wowv>!N!X-
Chapter 9 Electron Projection Lithography 285 G" &9u2 k
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata )F; ` 0 7
Chapter 10 Electron Beam Direct Writing 341 +Ze HZjd
K. Yamazaki 'r6s5 WC
Chapter 11 Electron Beam Induced Deposition 377
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K. Mitsuishi gV]]?X&
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 F)KUup)gc
P. A. Crozier and C. W. Hagen ikf6Y$nWfF
Chapter 13 Focused Ion Beams and Interaction with Solids 431 .XR`iX Y
T. Ishitani, T. Ohnishi, and T. Yaguchi ej dY h $
Chapter 14 Nano/Microstructuring of Ceramic Surfaces 26| 2 r
by Unconventional Lithographic Methods 471 Wi_5.=
R. C. Salvarezza and O. Azzaroni w=>~pYASH
Chapter 15 Alternative Nanofabrication Approaches /Y("Q#Ueq
f or Non-CMOS Applications 499 ?2l#=t?PP
C. V. Cojocaru, F. Cicoira, and F. Rosei B:dk>$>uQ
Chapter 16 Nanofabrication of Nanoelectromechanical Systems 24Lo .
(NEMS): Emerging Techniques 543 %(h-cuhq
K. L. Ekinci and J. Brugger / *J}7
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