wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications 0x]?rd+q8Q *W^ZXhrZ 目录: "&4r!2A d(ypFd9z 3/Z>W|w#w Chapter 1 Atom, Molecule, and Nanocluster Manipulations w7Y@wa! for Nanostructure Fabrication Using Scanning fG$LqzyqlK Probe Microscopy 1 ^i!6z2/ A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo u-4@[*^T$ Chapter 2 Atomic Force Microscope Lithography 33 m9i/rK_ N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park Pgy[\t 2K Chapter 3 Scanning Probe Arrays for Nanoscale Imaging,
xz5A[)N Sensing, and Modification 65 $YcB=l C. Santschi, J. Polesel-Maris, J. Brugger, Dat',5 and H. Heinzelmann fHH Chapter 4 Using Biomolecules for Self-Assembly of Engineered 6(4d3}F Nano-Scale Structures and Devices 127 Q3&q%n|< R. Mehta, J. Lund, and B. A. Parviz
HDZl;= Chapter 5 Nanofabrication Based on Self-Assembled {$yju _[ Alumina Templates 159 uh2_Rzln S. Sen and N. A. Kouklin kV5)3%? Chapter 6 Nanowire Assembly and Integration 187 "2sk1 Z. Gu and D. H. Gracias 5~ :/%+F0= Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 25{_x3t^ L. Tong and E. Mazur y;8&J{dd Chapter 8 Extreme Ultraviolet Lithography 235
Pn[oo_)s H. Kinoshita MsP6C)dz Chapter 9 Electron Projection Lithography 285 *tEqu%N1' T. Miura, K. Suzuki, H. Arimoto, and S. Kawata ^ W?cuJ8 Chapter 10 Electron Beam Direct Writing 341 $#u'XyA K. Yamazaki qa
)BbK^i Chapter 11 Electron Beam Induced Deposition 377 s:"Sbml K. Mitsuishi DHw)]WB M Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 bSX/)')jU P. A. Crozier and C. W. Hagen @&WHX# Chapter 13 Focused Ion Beams and Interaction with Solids 431 g""GQeR T. Ishitani, T. Ohnishi, and T. Yaguchi -YKy"
Chapter 14 Nano/Microstructuring of Ceramic Surfaces JDE_*xaUV by Unconventional Lithographic Methods 471 fZ7AGP R. C. Salvarezza and O. Azzaroni @CL#B98jl Chapter 15 Alternative Nanofabrication Approaches g]2L[4 f or Non-CMOS Applications 499 z"UC$ C. V. Cojocaru, F. Cicoira, and F. Rosei g;8 wP5i Chapter 16 Nanofabrication of Nanoelectromechanical Systems %60 OS3 (NEMS): Emerging Techniques 543 ^sLx3a K. L. Ekinci and J. Brugger oYStf5 ;'uQBx}
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