| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications m80Q Mosp
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations ROW8YTYb
for Nanostructure Fabrication Using Scanning P!0uAkt9C
Probe Microscopy 1 v 0apEjT
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo l)4KX{Rz{A
Chapter 2 Atomic Force Microscope Lithography 33 z|<6y~5,
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park TMT65X!
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, j_j~BXhIS
Sensing, and Modification 65 -'*B%yy
C. Santschi, J. Polesel-Maris, J. Brugger, %f*8JUE16
and H. Heinzelmann L|u \3.:
Chapter 4 Using Biomolecules for Self-Assembly of Engineered G ZDyw9
Nano-Scale Structures and Devices 127 J
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R. Mehta, J. Lund, and B. A. Parviz dE%rQE7'
Chapter 5 Nanofabrication Based on Self-Assembled l _dWS9
Alumina Templates 159 W{*U#:Jx1
S. Sen and N. A. Kouklin j[F\f >
Chapter 6 Nanowire Assembly and Integration 187 `DUMTFcMX
Z. Gu and D. H. Gracias /hQTV!\u
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 jL<:N
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L. Tong and E. Mazur 9h9 jS~h
Chapter 8 Extreme Ultraviolet Lithography 235 wJNiw)C
H. Kinoshita %}J [ EV
Chapter 9 Electron Projection Lithography 285 :uSo 2d
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata ;w a- \Z
Chapter 10 Electron Beam Direct Writing 341 kD8$ir'UYG
K. Yamazaki RplLU 7
Chapter 11 Electron Beam Induced Deposition 377 h-].?X,]Q
K. Mitsuishi ;xS@- </:
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 &z+nNkr?yN
P. A. Crozier and C. W. Hagen $^?Mip
Chapter 13 Focused Ion Beams and Interaction with Solids 431 64fa0j~<*M
T. Ishitani, T. Ohnishi, and T. Yaguchi 7;2j^qPr
Chapter 14 Nano/Microstructuring of Ceramic Surfaces #.'0DWT \-
by Unconventional Lithographic Methods 471 ^<}9# q/rt
R. C. Salvarezza and O. Azzaroni .D!0$W mOZ
Chapter 15 Alternative Nanofabrication Approaches jAie[5
f or Non-CMOS Applications 499 ?\"GT] 5D
C. V. Cojocaru, F. Cicoira, and F. Rosei J<'[ P$D
Chapter 16 Nanofabrication of Nanoelectromechanical Systems Ub2t7M U
(NEMS): Emerging Techniques 543 m(i8 4~
K. L. Ekinci and J. Brugger 1hp`.!3]H
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