| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications JQ!D8Ut
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目录： .BuY[,I+
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations @:X~^K .
for Nanostructure Fabrication Using Scanning &H<-joZ)Z\
Probe Microscopy 1 jO3Z2/#
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo FX 0^I 0
Chapter 2 Atomic Force Microscope Lithography 33 OP{ d(~ +
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park L9&Z?$6J_p
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, >(p "!
Sensing, and Modification 65 %. [t(F
C. Santschi, J. Polesel-Maris, J. Brugger, qVx0VR1:
and H. Heinzelmann &$|k<{j[<f
Chapter 4 Using Biomolecules for Self-Assembly of Engineered 5,k&^CK}
Nano-Scale Structures and Devices 127 g.Z>9(>; Y
R. Mehta, J. Lund, and B. A. Parviz E: L =>}
Chapter 5 Nanofabrication Based on Self-Assembled -(@dMY
Alumina Templates 159 /\ (0@To
S. Sen and N. A. Kouklin 3L/>=I{5
Chapter 6 Nanowire Assembly and Integration 187 aa8W Rf
Z. Gu and D. H. Gracias =&< s*-l[
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 .^fq$7Y}7
L. Tong and E. Mazur AS'a'x>8>,
Chapter 8 Extreme Ultraviolet Lithography 235 ?&j[Rj0pH
H. Kinoshita +3!um
Chapter 9 Electron Projection Lithography 285 Lr V)}1&5
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata [_#9 PH33
Chapter 10 Electron Beam Direct Writing 341 mM&H; W
K. Yamazaki 7JQ5OC3
Chapter 11 Electron Beam Induced Deposition 377 K zG8K 6wZ
K. Mitsuishi /)e&4.6
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 ~W _m<#K(
P. A. Crozier and C. W. Hagen @I _A\ U{
Chapter 13 Focused Ion Beams and Interaction with Solids 431 5a&[NN
T. Ishitani, T. Ohnishi, and T. Yaguchi .YKQ6
Chapter 14 Nano/Microstructuring of Ceramic Surfaces & Dgho
by Unconventional Lithographic Methods 471 y!h$Z6.
R. C. Salvarezza and O. Azzaroni &1 {RuV&t
Chapter 15 Alternative Nanofabrication Approaches D9 OS,U/l
f or Non-CMOS Applications 499 8yF15 ['
C. V. Cojocaru, F. Cicoira, and F. Rosei X )$3sTj
Chapter 16 Nanofabrication of Nanoelectromechanical Systems H*?U@>UU
(NEMS): Emerging Techniques 543 IF(W[J
K. L. Ekinci and J. Brugger 0bVtku K;G
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